In the nanometer-scale world of semiconductor lithography，
where even sub-micron vibration can compromise chip yields,
our high-precision cross roller bearings deliver the uncompromising
stability and accuracy required for next-generation photolithography
equipment.

Our Bearings:
✔ Atomic-Level Stability – Near-zero rotational error (<0.1 arc-sec) ensures
flawless wafer stage positioning for EUV/DUV systems.
✔ Nanometer-Scale Vibration Damping – Proprietary raceway polishing
minimizes micro-vibrations during high-acceleration scans.
✔ Thermal Drift Immunity – Ultra-low thermal expansion materials
maintain alignment under laser-induced temperature fluctuations.
✔ Vacuum & Cleanroom Ready – Special coatings and outgassing-free
materials meet SEMI-Class 1 requirements.

Critical Applications in Lithography:

Wafer stage rotary/linear motion systems

Reticle handling and alignment modules